Used NANOMETRICS NanoSpec AFT 210 #9226128 for sale

NANOMETRICS NanoSpec AFT 210 is a robust and sophisticated mask and wafer inspection equipment. Designed and manufactured by NANOMETRICS, a global leader in the optical metrology equipment industry, the system offers advanced features and capabilities to help users detect lithography defects on wafer and mask surfaces. In addition to its industry-leading optical performance, the unit also provides useful alignment and alignment performance capabilities to enable precision masking operations. The machine is comprised of several components, including an integrated metrology software, two high-resolution cameras, and a custom illumination package. The software provides users with powerful, flexible, and easy-to-use systems for image acquisition, analysis, and metrology. The cameras support HiSIM, HiMTF, and Overlay measurements, and their high-resolution capabilities make them ideal for high-throughput mask and wafer die inspection. The custom illumination package delivers intense, uniform light to ensure the highest-quality images and results The tool features four measurement modes, including Mask Photocurrent, Coating Quality, and Resist Film inspection. The Mask Photocurrent mode inspects the wafer for aberrations, while the Coating Quality mode examines the outer layer of the wafer. The Resist Film inspection mode helps identify any defects or changes in the resist layer. The asset also supports a variety of different file formats, making it ideal for use with a range of software programs. The model also offers an advanced focus mechanism, which performs consistent and repeatable measurements across the entire mask or wafer. Additional features include reticle-to-reticle overlay alignment measurements, as well as alignment accuracy and analysis capabilities. The equipment also features NANOMETRICS AssistIQ software, which provides users with a guided and intuitive image analysis process. Overall, NANOMETRICS NANOSPEC / AFT 210 is an extremely sophisticated and accurate mask and wafer inspection system. Its advanced features and capabilities deliver high-quality images and top-notch results, helping users quickly and accurately detect any lithography flaws or defects. Its flexible and easy-to-use software ensures that users can properly utilize the unit in any environment.