Used NANOMETRICS NanoSpec AFT 210 #9280739 for sale

NANOMETRICS NanoSpec AFT 210 is a comprehensive mask and wafer inspection equipment for front-side metrology, defect detection, and feature analysis. Designed for use in semiconductor fabrication, this system provides an easy-to-use platform to automate inspection processes. This platform features small part analysis capabilities for wafers as small as 25 mm. The unit uses nanoscale displacement sensing technology to measure photolithography defects, surface profiles, and other features on ICs, micro parts, and other components. The machine also supports defect detection at the nanoscale level, using features such as current analysis, optical failure inspection, and footprint analysis. NANOMETRICS NANOSPEC / AFT 210 offers an array of image analysis and measurement features to enhance its capabilities. An integrated merge/split tool allows for correlating wafer images with their component parameters. The edge detection algorithms help to improve the accuracy of feature measurements, while a built-in quantitative defect library offers a convenient visual aid for setting-up and analyzing measuring and defect conditions. The asset's interface is user-friendly, allowing operators to easily select parameters, view the collected data, and analyze results. It also provides an automated defect review mode to streamline quality control. It is equipped with a high-speed AutoFocus feature for reliable imaging, and an equipped multi-angle measurement function which allows for measuring up to two angles simultaneously. The model also features configurable inspection modes to ensure accuracy and reliability. NanoSpec AFT 210 provides an efficient and comprehensive solution for mask and wafer inspection. Its nanoscale defect detection capabilities, user-friendly interface, high-speed AutoFocus feature, and extensive image analysis and measurement capabilities make it a reliable and efficient platform for quality inspection in the semiconductor fabrication process.