Used NEUVIS IR2R #293608593 for sale

NEUVIS IR2R is a state-of-the-art mask and wafer inspection equipment designed to detect surface defects with extremely high accuracy. The system uses the special capabilities of infrared spectroscopy to detect defects that may not be visible to the naked eye. The unit is capable of up to 10,000 samples per hour and can measure from 5µm to 70mm in size. It has a 7-inch LCD touch screen display that allows users easy and intuitive operation. The machine uses five main techniques for detecting surface defects. It is capable of static or dynamic measurements, in which various types of imaging techniques such as triangulation or structured light scanning can be used. It also uses Scanning White Light Interferometry (SWLI) to measure the surface profile of wafers, as well as reflectance scans, compositional imaging and ellipsometry for measuring the properties of the surface materials. The tool is designed to scale up to large lots and can perform high-speed, non-destructive measurements suitable for a wide range of substrates including silicon, glass, quartz, ceramics, steel and more. The asset also includes advanced defect recognition and analysis capabilities, which allow users to quickly identify and characterize defects. The powerful software suite of the model includes a set of AI algorithms that provide an efficient approach to defect identification and determination of the underlying processes causing defect emergence. Some of the more advanced features of the equipment include customizable pass/fail criteria to identify the most optimal results, a data converter for producing an optimized 3D map of the inspected sample and dynamic pattern recognition for automatic defect classification. In addition, IR2R comes with remote monitoring, which allows users to monitor operations from anywhere with an internet connection. This feature helps users to remain informed about the processing status even when they are working remotely. The system also includes maintenance tools and performance optimization tools that allow users to diagnose unit problems easily and ensure optimal performance. Overall, NEUVIS IR2R is an advanced mask and wafer inspection machine that delivers reliable defect detection and analysis results. The tool's powerful software suite, high-speed measurements, advanced defect identification and remote monitoring capabilities, make it an ideal choice for a wide range of production environments.