Used RUDOLPH / AUGUST AXI-930 #9257476 for sale

RUDOLPH / AUGUST AXI-930 is a state-of-the-art mask and wafer inspection equipment designed for effective defect detection and metrology. This system provides high-resolution image acquisition, imaging magnification, and data inspection in a single unit, enabling quality control of semiconductor materials. Its modular design makes it an efficient tool for quality assurance and process control. AUGUST AXI-930 features a built-in high-precision quartz optics unit with up to 7x optical magnification, making it suitable for inspecting a variety of wafer sizes. It also includes an intuitive user interface with multiple imaging capabilities, allowing for customized defect reviews. The advanced image optimization tool allows operators to choose the best image for precise defect detection. RUDOLPH AXI 930 includes a high-resolution CCD camera for capturing images of high-accuracy. It also features a light-emitting diode (LED) illumination machine, providing uniform light for even and accurate illumination of the imaging area. This LED provides a large dynamic range, allowing users to make precise measurements with minimal shadows. The auto-calibration feature reduces setup time, and the automated defect classification algorithm helps speed up process evaluation. Additionally, automatic reticle compensation ensures low-cost alignment and feature positioning. The tool allows users to integrate measurement data for wafer certification. In addition to the features mentioned above, AUGUST AXI 930 also offers an integrated metrology data package (MDP), which includes a comprehensive set of measurement and analysis software tools. This comprehensive MDP tool allows for traceable process management parameters and controls. Overall, RUDOLPH / AUGUST AXI 930 Mask and Wafer Inspection Asset is the perfect tool for any semiconductor fabrication, laboratory, quality control, or laboratory environment. With its powerful features, this model provides superior imaging results and precision measurements for maximum efficiency.