Used RUDOLPH / AUGUST AXI-S #293706155 for sale

RUDOLPH / AUGUST AXI-S is a state-of-the-art mask & wafer inspection equipment developed by AUGUST. AUGUST AXI-S system combines high-end optical imaging technology with comprehensive measurement and defect detection capabilities. The unit includes a custom optics platform that can capture images with superior resolution and contrast. Multiple magnifications are available, allowing for detailed inspection of small and large features on both mask and wafer surfaces. RUDOLPH AXI-S machine includes advanced defect detection algorithms for both structured and unstructured images. These algorithms can detect anomalies such as dielectric bridging, voids, foreign particles, pinholes, electrical shorts, slivers, bubble defects, and more. In addition, the tool includes built-in pattern matching capabilities that allow for the detection and classification of noteworthy and recurrent patterns on mask and wafer surfaces. The asset is equipped with an intuitive user interface where operators can control and modify characteristics such as camera settings, lighting conditions, image enhancement, and defect types. Additionally, the user interface can be used to set specific wafer measurements and create custom reports for inspecting and documenting defects. The reports can include detailed feature measurements such as line widths and diameters, as well as image selections for further reference or analysis. AXI-S model also incorporates a host of automation features that enhance repeatability and accuracy of measurement results. These features include automated image stitching, batch processing, automated defect classification, and a shadow mask feature that allows for easy overlaying and comparison of multiple images. Overall, RUDOLPH / AUGUST AXI-S mask & wafer inspection equipment is a powerful and easy-to-use system capable of performing high-level optical inspections. The unit's advanced technology and automation features allow for high-speed, repeatable, and accurate evaluations for both mask and wafer defects, making it ideal for quality control and production environments.