Used RUDOLPH / AUGUST AXI-S #9350862 for sale
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ID: 9350862
Wafer Size: 12"
Vintage: 2004
Wafer inspection system, 12"
2004 vintage.
RUDOLPH / AUGUST AXI-S Mask and Wafer Inspection Equipment is an advanced automated inspection system, designed for the automated process control of photomasks, 30x30 mm wafers challenges and other small parts. The unit consists of several components: the casing, the optical systems, the controller and the image processing unit. The casing of AUGUST AXI-S Mask and Wafer Inspection Machine is designed for easy operation. It features a large, ergonomically designed work surface, two controller displays and four integrated gloveboxes to facilitate the handling of inspected parts. The optical tool of RUDOLPH AXI-S Mask and Wafer Inspection Asset consists of two powerful wedge-field planar microscopes, which allow both light microscopy and darkfield illumination for the imaging of optically smooth surfaces, or two transmitted light planar microscopes, which allows both epi-illuminator and phase contrast operation for the imaging of not optically smooth surfaces. According to the application, these optics can be connected to either two CCTV cameras, two CCD cameras from Nikon, one USB 2.0 camera from Carl Zeiss or a digital camera from Olympus. Furthermore, AXI-S Mask and Wafer Inspection Model is equipped with an advanced image analysis and measurement software with an integrated defect classification equipment to quickly detect and classify defects in the inspected surface. The system offers the possibility to store and recall inspection parameters, to export results and images to external systems, as well as to store and analyze all images. To guarantee an efficient operation, the unit is equipped with a controller, allowing the operator to control the microscope in both manual and automatic mode. The controller features a function generator and a calibration wizard to make sure the parameters are optimized for the application. Finally, RUDOLPH / AUGUST AXI-S Mask and Wafer Inspection Machine is optimized for the inspection of photomasks, 30x30 mm wafers and other small parts. It can be easily integrated into existing production lines and process control systems, featuring an intuitive user interface and a wide range of analysis capabilities. The tool is designed for easy operation and provides reliable results at the highest resolution.
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