Used RUDOLPH / AUGUST NSX 105C #9300479 for sale

RUDOLPH / AUGUST NSX 105C Mask & Wafer Inspection Equipment is a high-resolution system for inspecting the masks and wafers used in modern semiconductor fabrication processes. The unit utilizes 2nm resolution optics, which provide high accuracy image resolution for inspecting even the most intricate patterns. The optics are connected to a high resolution scan camera, which provides outstanding image definition. AUGUST NSX-105C provides excellent benefit to the semiconductor fabrication process, as it is capable of performing multiple defect inspection, as well as evaluating process conformance to specification. The machine consists of two primary units, a light source module and an automated detection module. The light source module provides a wide range of illumination including LED, laser, and arc lamps. The automated detection module can detect defects in multiple planes. It also provides software for the analysis and management of image data. RUDOLPH NSX 105 C is designed to meet the exacting needs of modern semiconductor device fabrication. Its advanced optics allow for dramatic imaging improvements over older wafer inspection systems. The tool utilizes a proprietary aerial image sensing technology, which allows it to scan the entire surface of the wafer in the time it takes to make a single scan. The lightweight and compact design of the asset makes it ideal for use in high-volume production environments. NSX 105 C also offers advanced defect detection capabilities. It is equipped with multiple advanced detection algorithms, ensuring excellent defect detection performance. Users are also able to utilize the model for fast and efficient data analysis. The equipment is extremely user-friendly and provides helpful feedback and supply analysis tools for maximum defect detection accuracy. Overall, NSX-105C Mask & Wafer Inspection System is an advanced unit for inspecting masks and wafers that is suitable for high volume production environments. Its advanced optics allow for high resolution images that enable fast and accurate defect detection. The machine is highly user-friendly and feature-rich, making it a valuable asset to the semiconductor device fabrication process.