Used RUDOLPH / AUGUST NSX 115 #293598219 for sale

RUDOLPH / AUGUST NSX 115 is a high-performance mask and wafer inspection equipment designed to detect defects in a variety of semiconductor device applications. This system uses advanced imaging technology and advanced algorithms to inspect a variety of materials including advanced packaging and optoelectronics. It is capable of detecting image-related defects, such as line width variations, pattern shift, open/broken circuits on logic and memory wafers, and ultra-fine Cu/Al wiring. AUGUST NSX 115 unit features a fully automated integrated design that requires minimal operators and allows for cost-effective automated inspection. It is equipped with powerful optical imaging capabilities, including advanced pattern recognition, Wafer Identification Reader (WDIR), pattern inspections and automatic particle detections. It also offers a wide range of inspection speeds, including fast scanning speed and precision measurement of device features. RUDOLPH NSX 115 features a high-resolution full-color screen and an intuitive user interface, enabling a fast and efficient comparison of data from multiple masks and wafers. This machine has a wide range of integrated inspectability options, including die-to-die inspection, wafer-to-wafer inspection and simultaneous die-to-die and wafer-to-wafer inspections. It also offers a unique pattern recognition library for automated classification of defects, as well as an advanced pattern matching algorithm for reduced false detection. The tool further simplifies operations with its fully-automated vision-based inspection capability, which eliminates the need for manual sample inspection and the need for costly hardware. The asset's multi-zone verification capabilities offer cost effective solutions for detecting partial defects. In addition, NSX 115 has excellent repeatability and reproducibility and offers superior defect detection sensitivity, facilitating superior defect characterization and yield analysis. Overall, RUDOLPH / AUGUST NSX 115 model is a versatile, high performance, and highly cost-effective mask and wafer inspection equipment designed to meet the stringent requirements of semiconductor device applications. With its advanced imaging technology, fast scanning speed and intuitive user interface, this system is a powerful tool for detecting critical defects and improving yield.