Used RUDOLPH / AUGUST NSX 115 #293615443 for sale

AUGUST NSX series 115 is a mask and wafer inspection equipment designed to enable high-precision imaging of microelectronic devices. The system utilises a 5-axis motion platform and advanced optomechatronic and imaging components, to accurately capture and process images of both masks and wafers with exceptional clarity and detail. At its core, the airborne particles are detected by a CCD camera and an embedded photomask. The CCD camera captures brightfield images of the sample, which are then analysed by four high-accuracy lenses. Captured images are assessed and inspected for irregularities in the patterns, the presence of contaminants, or the detection of any defects. Processing of the images is managed by a proprietary algorithm, which permits the unit to compare the images with a reference standard. The result of the comparison is then used by the machine to identify any flaws within the device or material. The tool further supports the integration of user-defined programming control and additional data processing features. In addition, RUDOLPH NSX series 115 offers a range of advanced features that enable it to build a picture of the lapping and polishing process. The algorithm links the CCD cameras on the asset to the motion platform, allowing it to calculate angular velocities, translational velocities, and the total number of samples scanned. The model further allows the slowing down if motion motion to enable fine-tuning of the lapping and polishing process. To further support a variety of applications and sample types, RUDOLPH / AUGUST NSX series 115 can be configured with different optics, immersion devices, and light soures. Furthermore, the entire equipment is built for maximum reliability and durability. This includes both the optical components and the automated and semiautomated processes, the system is capable of executing. In conclusion, AUGUST NSX series 115 is an advanced mask and wafer inspection unit that offers superior performance for demanding microelectronic production environments. The machine packs a range of features that ensure exceptional clarity and detail of the images captured by its optomechatronics and imaging components. Furthermore, the tool implements a sophisticated algorithm to compare images with a reference standard, enabling the detection of any irregularities or defects in the process.