Used RUDOLPH / AUGUST NSX 115D1 #9270582 for sale

RUDOLPH / AUGUST NSX 115D1 Mask & Wafer Inspection Equipment is a highly advanced, compact, and energy-efficient system designed for inspecting semiconductor devices. It is capable of efficiently examining the patterns and features on the masks and wafers, enabling for accurate inspection and analysis of the finished products, ensuring high-quality and reliable wafers. It offers various features such as rapid image detection and correction, high-resolution imaging, automated processing and measurement, and flexible image acquisition modes. The unit uses an advanced light source with high-bright illumination for uniform coverage of the inspection area. This makes it possible to detect even the smallest features on the masks and wafers. The user can also control the illumination level to obtain the required contrast and contrast sensitivity. The machine has an integrated laser scanning stage that provides high speed and accuracy during image acquisition. Additionally, there is a dedicated headstage to accurately position and align the wafers for detecting errors in the pattern or features. AUGUST NSX 115D1 incorporates a laser-based open architecture that makes it easy to provide custom analysis and measurement on different types of patterns and defects. It also offers several integrated pre-processing functions, such as filtering, sharpening and edge detection, which enable faster and more accurate defect detection. The tool also incorporates a high-resolution Color Camera to acquire panoramic imaging of the items under inspection. There is further a 23.5 inch LCD touch screen monitor, that provides an easy and intuitive interface for the user to operate the asset. Moreover, RUDOLPH NSX 115 D 1 is equipped with the latest integrated software. The user can access various inspection and analysis functions, allowing for accurate detection of defects on the masks and wafers. The software also provides a complete 3D analysis of the images, enabling further defect recognition and processing. The model is equipped with a user-friendly interface, providing complete access to the internal settings and parameters of the instrument, enabling efficient usage of the equipment in the production process. The instrument further features thermal and vibration protection and is suitable for use in a wide range of working conditions. Overall, RUDOLPH NSX 115D1 Mask & Wafer Inspection System is an advanced and state-of-the-art unit that can provide users with a comprehensive and accurate assessment of the masks and wafers. Its features and capabilities make it an ideal tool for inspecting semiconductor devices.