Used RUDOLPH / AUGUST NSX 320 #293641043 for sale

RUDOLPH / AUGUST NSX 320 Mask & Wafer Inspection Equipment is an advanced automatic equipment designed to detect and monitor the characteristics of substrates and masks used in the manufacture of semiconductors. AUGUST NSX 320 combines the latest in surface observation technology with an easy-to-use interface and precise process capability to provide a one-stop company for mask and wafer inspection needs. RUDOLPH NSX 320 uses advanced imaging technology to acquire high-resolution pictures of both masks and substrates. This allows users to examine patterns for defects, contaminants or other issues affecting their processes at a microscopic level. The system is further equipped with specialized performance parameters that allow users to customize the accuracy and resolution of the inspection results. In the wafer inspection part of the unit, NSX 320 offers advanced defect-detection capabilities and process optimization features. The machine is designed to allow users to audit their processes quickly and accurately by automatically tracking, computing and comparing parameters such as defect-density, throughput, yield and more. The tool can generate detailed reports in a variety of formats, including spreadsheets and PDFs, while simultaneously providing process traceability and improved quality control. The mask inspection features of RUDOLPH / AUGUST NSX 320 include masks of all sizes and layer types, including artworks and 3D photomasks. The asset applies expert algorithms to pinpoint very subtle pattern imperfections such as misalignments, deformations and discrepancies. The Mask MASA Technology is utilized for automated and manual measurement and analysis of patterns, allowing for quick and precise determination of critical defect-free areas. AUGUST NSX 320 also lists an array of advanced calibration and monitoring features. These tools are designed to ensure accuracy, detect all existing errors, and minimize any new ones, allowing the user to verify the position and shape of a masking layer, and thus optimize its results. In addition, various job-control and automatic-detection functions are available to help users save time and resources during routine maintenance or product development. In conclusion, RUDOLPH NSX 320 Mask & Wafer Inspection Model is an advanced and reliable automated inspection solution that can provide users with improved process control and product quality assurance. The equipment offers a wide range of features and capabilities, including advanced imaging, masking, calibration, monitoring and more, allowing to quickly and accurately detect and identify mask and wafer defects, faster and more efficiently than ever before.