Used RUDOLPH / AUGUST NSX 320 #9229193 for sale

RUDOLPH / AUGUST NSX 320 mask & wafer inspection equipment is a powerful integrated tool used for quality control and defect detection. It combines advanced optics, image processing technology, and an intuitive user-friendly environment to enable reliable measurements of topography, wafer profile, and microstructure on a wide range of materials, up to 6" wafers. The main components of the system include a high-resolution camera, optical box, xy-stage, and solid-state recording unit. The optics box houses a direct optical microscope, a quadrant combination laser interferometer, and a laser machine. The optical microscope contains a high-resolution CCD camera with variable magnification from 4x to 30x. The laser tool consists of four lasers precisely calibrated to measure the height profile of the wafers. The xy-stage allows the wafers to be moved to different focus points. AUGUST NSX 320 uses advanced image processing algorithms to process the acquired images with speed and precision. The images are processed to yield topography and reflectivity maps of the wafers with accuracy down to 1 micron. The maps are then laid out in a color-coded display, allowing technicians to quickly identify defects on the wafers. In conjunction with the stage's autofocus capabilities, this allows the asset to accurately measure the profile, micron-level features, and composition of each type of wafer. Additionally, RUDOLPH NSX 320 software includes a comprehensive suite of tools for automating the process of identifying and classifying defects. This includes algorithms for defect detection, assessment, and characterization. The software also includes a library of defect signatures, allowing inspectors to quickly compare known defect signatures to identify them in a fraction of the time it would take a human. NSX 320 model is an integrated, powerful, and highly precise tool for inspecting and analyzing wafers and masks. It combines cutting-edge optics, image processing, and user-friendly software to enable accurate measurement of a wide range of materials, up to 6" wafers. It is indispensable for modern semiconductor production, ensuring the quality and reliability of manufactured wafers.