Used RUDOLPH / AUGUST NSX 320 #9277085 for sale

RUDOLPH / AUGUST NSX 320 is a precision mask and wafer inspection equipment designed for use in the semiconductor production process. This tool utilizes cutting edge imaging technology with a three-axis motion system to deliver the most accurate and reliable image-based semiconductor inspections possible. The unit offers multiple field sizes, oblique angles and a wide range of fields of view. The near-field imaging configuration produced by AUGUST NSX 320 sets it apart from other instruments, providing unmatched resolution and accuracy. The machine is equipped with high-performance optics and a servo-control scanning stage. The large scanning stage allows for a wide range of wafer sizes, while the imaging optics offer a variety of imaging resolutions depending on the application needs. The NSX features a multispectral optical design that enables imaging across UV, UV-visible, and dry NIR wavelengths. Additionally, its large scanning area can accommodate multiple chips in a single scan cycle, increasing throughput. RUDOLPH NSX 320 also offers outstanding analysis capabilities. It supports a variety of automatic defect detection techniques such as Boolean logic and trend analysis, in addition to manual analysis capabilities. The tool's automated pattern recognition and comparison tools are highly reliable and provide users with unprecedented accuracy. It also supports advanced 3D stereogram analysis of complex structures, and provides intuitive operation with a graphical user interface. In summary, NSX 320 is a state-of-the-art mask and wafer inspection asset. It features a wide range of imaging capabilities, a large scanning stage, and advanced analysis features. Additionally, it supports manual and automated defect detection and provides sophisticated 3D stereogram analysis. This model provides semiconductor professionals with high accuracy, reliability and ease of use, making it an ideal choice for production environments.