Used RUDOLPH / AUGUST NSX 90 #293639939 for sale

RUDOLPH / AUGUST NSX 90 mask and wafer inspection equipment is a high-precision non-contact optical imaging system designed for detailed inspection of opaque, semi-transparent, or transparent 3D mask and wafer samples. It offers fast, accurate scanning of densities down to 0.001 mm and can measure and analyze a variety of parameters including surface texture, texture uniformity, pitch, line width, line edge roughness, and line end corner rounding. The unit supports up to 4 cameras, each with up to 8 megapixel resolution, enabling a zoom of up to 100x with a field of view of up to 7.5 mm. The powerful image-processing engine allows complex 3D mask and wafer samples to be scanned and inspected in less than 8 minutes. AUGUST NSX 90 provides accurate, reliable surface inspection and analysis of a wide range of wafers and masks, from planar to 3D structures. The machine features a highly advanced optical design that delivers improved image contrast, image sharpness and quick scanning. The optical imaging is combined with a powerful image-processing tool for accurate defect detection and classification. RUDOLPH NSX-90 asset features an intuitive, web-based graphical user interface (GUI) that allows for easy data entry and control of the inspection process. It also includes an SPC module for statistical analysis, a parts list of measured samples, and a quality control report generator for easy inspection auditing. To meet the needs of large production facilities, RUDOLPH NSX 90 model is compatible with various accessory mountings and accessories, including robotics, conveyor tracking units, and robot turrets, creating a fully automated equipment. This makes the inspection process more efficient and accurate, and hence more cost-effective. Overall, NSX-90 mask and wafer inspection system is a highly capable visualization and inspection tool. It offers excellent imaging resolution, quick inspection turnaround, reliable results, and easy-to-use GUI. It is an ideal solution for quality assurance, process control, and reliable defect detection in various types of mask and wafer samples.