Used RUDOLPH / AUGUST NSX 95 #293755012 for sale

ID: 293755012
Defect inspection systems.
RUDOLPH / AUGUST NSX 95 Mask & Wafer Inspection Equipment is a state-of-the-art optical inspection system designed to enable the detection of defects and contamination on the surface of semiconductor wafers, reticles, masks, and flat panels with unparalleled clarity. In addition to standard optical inspection, the unit comes equipped with advanced ColorMap™ Technology, a visualization method that displays defects in a standard and intuitive format. AUGUST NSX-95 machine uses advanced image processing algorithms to detect defects while achieving millisecond processing speeds with hardware compression. This allows the tool to recognize objects quickly and accurately, as well as process complex, overlapping images without latency. Features such as on-board edge de-scaling and image restoration ensure that the inspection results are always accurate and reliable. The asset is equipped with a high-performance wafer scanning model for complete recognition and capture of surface defects and contaminants. It utilizes a large field of view, a high-resolution camera, and a high-powered, near-infrared LED source for maximum performance and sensitivity. The equipment also features a range of mask and reticle measurement tools, which enable users to measure defects and contamination including missed features, proximities, and uniformities. The system also measures the position of defects relative to the edges of each design element, allowing users to detect defects that are too small or too close to the edge of a design element to be detected by most standard systems. The unit is expandable, allowing users to customize its functionality to meet the needs of their specific applications. Optional camera and illumination upgrades offer improved sensitivity and performance while mask measurement tools and automatic defect classification capabilities can be added as needed. RUDOLPH NSX 95 Mask & Wafer Inspection Machine provides a complete solution for mask and wafer inspection, enabling users to detect defects and contamination quickly, accurately, and reliably. With its high performance, innovative features, and expandability, the tool is suitable for a wide range of inspection requirements.
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