Used RUDOLPH / AUGUST NSX 95 #293755120 for sale

RUDOLPH / AUGUST NSX 95 mask & wafer inspection equipment is an advanced, fully automated wafer inspection system. It combines a high resolution scanning electron microscope (SEM) with a robotic wafer stage for fast, precise wafer inspection. AUGUST NSX-95 is designed for fast and accurate inspection of the tightest layout tolerances of wafers down to 45nm process technology. It is capable of detecting defects in the production of semiconductors at the ultra-deep sub-micron (uDSM) level. RUDOLPH NSX 95 has a high speed, high resolution, color SEM with a maximum resolution of 0.2nm and an image size up to 1000x1000µm. This provides the highest magnification and field of view needed for accurate defect measurement and recognition. A robotic wafer stage and integrated die area analysis option provide high speed, non-destructive defect evaluation of both production and reference wafers. The mask & wafer inspection unit also features a high resolution LED lighting machine, which allows samples to be viewed side-by-side under the same illumination conditions. This feature is essential for color-coded techniques including pattern recognition. AUGUST NSX 95 is equipped with a powerful automatic sample positioning tool, allowing accurate and fast sample positioning, which reduces sample loading time. RUDOLPH NSX 95 includes several advanced features to provide users with the highest precision defect recognition. These features include a defect recognition algorithm (DRA), which allows fast and reliable defect recognition. The DRA can detect both inline production and reference defects. It also has an automated particle analysis (AiPA) option for quick particle analysis, and an automated sample assignment (ASA) which allows the asset to select the correct wafer based on user input. Finally, NSX 95 offers a direct defect transfer to the backend process model and robust data storage, as well as remote diagnostics/troubleshooting via a secure internet connection. This enables easy setup and high-speed data transfer for faster turnaround times. Overall, RUDOLPH NSX-95 is a powerful and reliable mask & wafer inspection equipment which allows rapid and accurate wafer-level defect inspection. The high-speed scanning electron microscope and robotic wafer stage provide fast, precise sample positioning and image analysis. The LED lighting system, defect recognition algorithm, particle analysis and automated sample assignment feature all make the unit efficient and reliable while delivering the highest precision defect recognition in production and process development.