Used RUDOLPH / AUGUST NSX 95 #9206002 for sale

RUDOLPH / AUGUST NSX 95 is a state-of-the-art mask and wafer inspection equipment designed to identify any abnormalities on a wide range of masks and wafers. It provides high-resolution optical images of both sides of masks and wafers for detailed and reliable inspection. The system has a Digital Imaging Unit for quick and accurate image processing, as well as a patented Three Dimensional Measurement Technology (3DMT) for more detailed 3D measurements of defects. This machine features a parallel processing configuration with both optical microscopes, which enables real-time, high-speed inspections and therefore reduces machine idle time. The integrated defect analysis software includes an array of functions that enable users to objectively detect, classify and measure defects on masks and wafers. The automatic measurement and pass/fail analysis software also ensures accurate defect detection and eliminates human error. AUGUST NSX-95 also includes an advanced image acquisition tool that captures, stores and reviews data with video-tape playback and interactive digital video analysis. The asset also includes a scanning electron microscope and an x-ray diffraction model, which can be used to inspect the quality and accuracy of mask patterns. RUDOLPH NSX 95 is equipped with multiple stages for mask and wafer blocks that can be moved both vertically and horizontally, allowing for easy positioning of the masks and wafers for inspection. Furthermore, the advanced interface between the inspection equipment and external databases allows users to easily access data stored in various manufacturing machines and systems. In summary, NSX 95 is an advanced mask and wafer inspection system that provides reliable, detailed and accurate inspections. It features a Digital Imaging Unit, a patented Three Dimensional Measurement Technology (3DMT), an integrated defect analysis software, an advanced image acquisition machine, scanning electron microscope and an x-ray diffraction tool and multiple stages for mask and wafer blocks that can be moved both vertically and horizontally. It also provides a secure interface between the inspection asset and external databases, allowing quick and easy access to data.