Used RUDOLPH CV 9812 #9163869 for sale

RUDOLPH CV 9812 is a next-generation mask and wafer inspection equipment manufactured by RUDOLPH Technologies. The system provides high-quality and accurate results at exceptionally high throughput and is designed to image as many as 4 wafers/second. This unit takes a holographic approach to inspection, using pulsed light sources to capture successive images at different depths over the entire wafer surface. The machine is based on RUDOLPH Technologies' proprietary technology, using phase-shifting interferometry (PSI) technology to digitally detect defects and image features that may not be detectable using standard optical systems. CV 9812 can detect critical defects as small as 0.3um allowing for wafer inspection at 200 times higher resolution compared to traditional optical tool. The asset is fully automated and can be used on a wide variety of wafer types and materials. The model also includes integrated software that provides high-level abstraction capabilities for programming and image analysis. This automated feature allows for rapid printing of the detected defect features for easy visual inspection. The integrated software also offers image analysis tools such as mask alignment, image and feature comparison, as well as advanced imaging techniques including mask blurring and contrast enhancement. The equipment's design includes ultra-high-resolution imagers and lasers, allowing for non-destructive and comprehensive inspection. This allows not only for defect detection, but for visualization, printing, and analysis of each particle and its impact on the wafer. This level of control not only assures quality control, but also allows for the development of specific remedies to improve wafer yields. RUDOLPH CV 9812 offers unsurpassed image accuracy and uniformity, as well as repeatability and reliability. It is a robust and robustly-designed system, with a highly durable housing. Through its combination of high-resolution imaging, low noise imaging, and integrated software features, the unit offers an unprecedented level of control for mask and wafer inspection.