Used RUDOLPH NSX 105 #9362039 for sale

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RUDOLPH NSX 105
Sold
ID: 9362039
Wafer Size: 12"
Macro defect inspection system, 12".
RUDOLPH NSX 105 Mask & Wafer Inspection equipment is a system specifically designed to facilitate the rapid inspection and review of masks and wafers. It offers a wide variety of features that make it ideal for use in production, research, and development industries. The unit features a sophisticated wafer recognition and imaging machine. This tool utilizes electromagnetic imaging technology to generate a two-dimensional image of a mask or wafer that is up to 3µm in resolution. This allows for the identification and inspection of any defects or other anomalies that may be present on the surface of the mask or wafer. RUDOLPH NSX-105 incorporates a highly-sensitive sensor that is capable of detecting and measuring the uniformity of features on a wafer or mask. This provides insight into the production process of the wafers and masks. Furthermore, the automated analysis on the wafer or mask is performed with a high degree of accuracy, reducing the amount of time needed to inspect a single wafer or mask. The asset also features an automated data collection and analysis model. Once the image of the mask or wafer is collected, it is analyzed and sent directly to the production line or archive where the information can be reviewed. The automated data collection and analysis equipment handles all the data, allowing for more efficient review of the wafers and masks. NSX 105 also offers a wide range of software options. The system runs on Windows software, enabling users to customize the interface and settings. This allows users to tailor the unit to their specific needs and preferences. Finally, NSX-105 allows for remote operation. This allows multiple operators in different locations to operate the machine, allowing for wide-scale review of multiple wafers and masks in a timely and efficient manner. Overall, RUDOLPH NSX 105 Mask & Wafer Inspection tool is a sophisticated asset that simplifies the task of mask and wafer inspection. The model features state-of-the-art imaging technology and an automated data collection and analysis equipment. Furthermore, it allows for wide-scale review and customizable software. All of these features make RUDOLPH NSX-105 Mask & Wafer Inspection system an ideal choice for production, research, and development needs.
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