Used RUDOLPH NSX 105 #9412393 for sale

RUDOLPH NSX 105 is a Mask & Wafer Inspection Equipment, designed to provide high performance and reliability. RUDOLPH NSX-105 was designed to rapidly detect defects in line and space patterns as well as defects associated with photomask and wafer materials. NSX 105 uses a powerful optical configuration consisting of two widefield objective lenses and two telecentric imaging lenses. The system features an Angenieux zooming optics unit that regulates the motion and focus of the machine, which allows for the precise optical focusing of the machine. NSX-105 also boasts a darkfield array illumination tool for improved sensitivity in detecting defects and a telecentric configuration that ensures consistently accurate focusing across a wide range of magnifications. RUDOLPH NSX 105 is equipped with a high-resolution color touchscreen, which is both user-friendly and intuitive. This easy-to-use interface makes it possible to quickly setup the parameters of the inspection process, such as defect size and type. The asset also boasts a large field of view for convenient examination of large areas of the chip. RUDOLPH NSX-105 utilizes a variety of high-resolution sensors and illumination techniques in order to quickly detect and frame defects on wafers and masks. The versatile detection modes make this model able to detect every class of defect; such as, particle, lens-edge diffraction, bridging, marring, porosity, and etching. Furthermore, NSX 105 is also capable of rapid parallel examination100% of flat surfaces, a function known as "full-field" scanning. NSX-105 also offers a comprehensive replay analysis package, which maintains a complete record of all detected defects. This allows for the efficient and accurate tracking of defects over time and assists in locating defects on the wafer. RUDOLPH NSX 105 is undoubtedly one of the most reliable Mask & Wafer Inspection Systems available on the market. It offers superior detection of all classes of defects with high-resolution sensors and illumination techniques, along with a user-friendly touchscreen interface and a large field of view. This makes RUDOLPH NSX-105 an excellent choice for a variety of applications requiring quick and reliable inspection of photomask and wafer materials.