Used RUDOLPH NSX 115 #9212440 for sale

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RUDOLPH NSX 115
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ID: 9212440
Macro defect inspection system.
RUDOLPH NSX 115 is a high-end mask and wafer inspection equipment from RUDOLPH, a leader in think-through optoelectronic solutions. NSX 115 provides critical inspection capabilities for a wide variety of materials and applications in the semiconductor industry. It uses an advanced imaging optics system to detect subtle differences in device geometries or defects down to 0.2um. RUDOLPH NSX 115 is comprised of two primary components: the Inspection Processor Unit and the AccuVision Cloud Processing, which work together to deliver comprehensive defect detection and analysis capabilities. The Inspection Processor Machine is an integrated hardware platform that includes the camera, data processing tool, and other hardware components that support the data acquisition and processing task. The AccuVision Cloud Processing asset enables real-time image processing and feature extraction for high-detail application needs. NSX 115 is designed for high-end production lines, capable of scanning 100 percent of wafers and masks for defects and pattern measurements quickly and accurately. It features an automated laser triangulation tool to precisely measure critical dimensions in parts, while its high-fidelity algorithms perform quick and accurate defect detection and classification for both mask and wafer surfaces. RUDOLPH NSX 115's combination of speed and accuracy is further supplemented by its dynamic data analysis capabilities. The model is capable of combining multiple inspection types into one single analysis, enabling chip manufacturer clients to have greater visibility and control over production processes. The data gathered from the equipment's detailed defect analysis can be fed into statistical process control modules, effectively streamlining the defect detection process and ensuring the production process is in compliance with customer and industry standards. Aside from its technical capabilities, NSX 115 is also designed with user-friendliness in mind. An intuitive user interface makes it easy to train operators and ensure that the system produces consistent results with minimal setup and calibration time. Additionally, self-monitoring and maintenance capabilities ensure the unit remains in peak condition and can perform its tasks with minimal disruption. Overall, RUDOLPH NSX 115 is a comprehensive and reliable tool for mask and wafer inspection and analysis in the semiconductor industry. It empowers users with advanced imaging and analysis capabilities that ensure the highest quality and accuracy for all production lines. Whether it's for checking geometries, detecting errors, or performing complex inspections, NSX 115 is a powerful and reliable solution.
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