Used RUDOLPH NSX 115D #9223806 for sale

RUDOLPH NSX 115D is a powerful mask and wafer inspection equipment designed for use in semiconductor manufacturing. It provides a comprehensive platform for quality assurance in various stages of the manufacturing process. Using high-resolution optics, NSX 115D system offers quality control at the wafer or mask level. It quickly detects any defects, such as missing patterns, overhanging edges, broken lines or other critical issues. An optional scanning electron microscope (SEM) additionally offers top-down inspection capability, allowing for a more detailed view of any defects. RUDOLPH NSX 115D unit also offers advanced defect classification, enabling grouping of similar defects and analysis of the same. The machine is divided into three main areas and features three separate stages. The first stage focuses on pre-scanning. Here, images of the wafers are obtained for further processing. 3D tools enable large-scale imaging for a much more accurate result compared to a typical 2D scan. These pre-scanning images also serve as the benchmark for further comparison. The second stage is the editing stage, during which images are edited and adjusted for further optimization. During this stage a variety of algorithms are used to detect and recognize various kinds of defects, such as grains, scratches, particles and cracks. The third stage is post-scanning. After defect classification and analysis, the data is stored for later use. This step is designed to detect any potential latent defects and also ensure that there has been no change in the wafer or mask between stages. Overall, NSX 115D tool provides a comprehensive platform for quality control and analysis of wafers and masks. Featuring excellent optics, advanced defect classification and 3D processing, the asset is an ideal choice for semiconductor manufacturing quality assurance.