Used RUDOLPH NSX 115D #9260018 for sale

RUDOLPH NSX 115D is a state-of-the-art mask and wafer inspection equipment designed to identify contamination, surface defects, and other irregularities during semiconductor manufacturing processes. This system, which provides best-in-class automated performance, features a light source featuring a 4.7kW Xenon lamp, programmable optics, and an imaging unit featuring high-resolution CMOS sensors. With a total field of view of up to 1K x 2K pixels, the machine can inspect mask and wafers for features as small as 5 μm. NSX 115D features the patented SSR (Sub-Pixel Response) image processing technology, which allows for 100% pixel-level wafer and mask defect detection. It utilizes an image-based metrology tool to quickly identify and measure features and defects with only a few minutes of hands-on time. The asset is also equipped with a variety of software applications, including WaferMask, a mask/reticle inspection tool; WaferMarker, an automated wafer inspection tool; and WaferMapper, a mapping/focus tool. All of these applications are accessible through an intuitive graphic user interface (GUI). In addition, RUDOLPH NSX 115D supports a variety of data output formats such as TIF, BMP, JPG, and PDF. It also features an optional OCR (optical character recognition) ID reader, which can recognize various types of text and symbols on a wafer or mask. The model also comes with a comprehensive hardware support package including an adjustable illumination table, vacuum wand, automated wafer scanning and loading, and multiple camera positions. NSX 115D is the perfect tool for automated detection of features and defects in masks and wafers. With its comprehensive hardware and software package, it delivers best-in-class performance and reliability. Its support of a variety of data formats ensures that it is easy to integrate into any semiconductor manufacturing process. This makes RUDOLPH NSX 115D the ideal choice for any semiconductor process requiring automated inspection and diagnostics of mask and wafer inspection.