Used RUDOLPH NSX 115D1 #9260012 for sale

RUDOLPH NSX 115D1 is a high-tech mask and wafer inspection equipment designed to provide accurate and reliable photomask/reticle alignment and accuracy. The system includes two independently driven XY stages for mask or wafer manipulation, allowing for high-speed alignment, various lens options for different magnifications, precision angular measurement and centration, and other capabilities that ensure the highest accuracy of the inspection process. NSX 115D1 is capable of inspecting various masks and wafers with high-speed and accuracy. The unit features two motion axes, an X-axis and a Y-axis, offering a dynamic image capture range of up to 600mm × 800mm. The machine is able to provide accurate positioning and high-precision alignment of various photomasks and reticles used in the integrated circuit manufacturing process. In addition to the two motion axes, RUDOLPH NSX 115D1 also offers a variety of lens options for different magnifications, from 1/3X to 16X. This provides the user the flexibility to inspect wafers and masks with high magnification, while maintaining the highest level of accuracy. The tool can also measure angular deviation up to one degree accuracy, assuring a more precise alignment of the inspected mask or wafer. In order to ensure the highest accuracy and reliability, NSX 115D1 includes auto-focusing and post-measurement functions. The auto-focusing feature utilizes a pneumatic asset to automatically obtain the best image view. This ensures a steady and accurate determination of the best fitted alignment between mask and wafer. Meanwhile, the post-measurement functions provide a multi-parameter report that can be saved and accessed for review and/or future reference. Finally, RUDOLPH NSX 115D1 includes additional features that provide the user with ease of operation. Its three-dimensional touch screen display provides a descriptive and intuitive user interface for simple navigation. The model also provides a comprehensive training program consisting of both on-site and online courses that equip users with the knowledge to operate and efficiently troubleshoot the NSX equipment. Overall, NSX 115D1 mask and wafer inspection system is an ideal solution for highly accurate and reliable photomask/reticle alignment and accuracy, providing the user with a simple and effective way to inspect and align masks and wafers.