Used RUDOLPH WV 320 #9123216 for sale

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ID: 9123216
Macro defect inspection system, 12" 2005 vintage.
RUDOLPH WV 320 is a Mask and Wafer Inspection Equipment that is designed for the semiconductor industry. The system is capable of detecting the characteristics of the masks and wafers used for fabrication processes in semiconductor manufacturing. It is equipped with highly advanced technologies that enable the unit to accurately detect and identify even the smallest defects in the masks and wafers. The machine is composed of a high-definition digital color camera to allow for detailed inspection of the mask and wafer surfaces. This camera comes with 4K resolution, maximum light sensitivity and a wide dynamic range for clear and sharp images. The tool is also equipped with the latest in optical image-analysis software which allows for automated defect detection. This software is capable of high precision and high accuracy inspection and it can detect even the smallest of flaws and defects. The asset is also equipped with a digital dynamic stichoscope allowing for precise quantitative analysis, and a laser ruler for accurate dimensional measurements. This ensures that the mask and wafer samples are in compliance with the industry-standard specifications and specifications for any particular process. To ensure accuracy, the model can use contrast and focus imaging to identify minute surface defects, such as scratches, particles, and residual contamination. Coupled with its powerful image-processing and defect-detection capabilities, the equipment can detect a wide range of defects and flaws, including wedge, hole shape, IC paste line, and pad location. It is even capable of detecting shrinkage or expansion of the masks and wafers as they go through the various process stages and to detect potential defects before the masks and wafers are used in any of the manufacturing processes. In addition, the system includes an intuitive user interface that is designed to be both user-friendly and intuitive. Navigation menus and intuitive icons make operation of the unit easy and quick. The user interface also allows quick access to the full range of imaging features and tools as well as the ability to set user-defined parameters for improved accuracy. Moreover, the machine also has a built-in self-learning capability that allows it to become better at identifying defects as more images are analyzed and inspected. RUDOLPH WV320 is a robust and reliable mask and wafer inspection tool that helps reduce scrap rates, optimize product yields, and increase production quality. Its combination of advanced technologies and sophisticated image-processing algorithms make it an ideal solution for any semiconductor fabrication application.
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