Used RUDOLPH WV 320 #9183381 for sale

RUDOLPH WV 320 is a top of the line Mask and Wafer Inspection equipment developed by RUDOLPH Technologies. This system is designed for use in the research, development, and manufacturing of next-generation semiconductors and optoelectronics. RUDOLPH WV320 features advanced inspection capabilities utilizing color CCD cameras as well as state-of-the-art proprietary mask review algorithms. The unit features an ergonomically designed and configurable operator interface for assessing masking and wafer inspection operations. Automation and sensors manage changes in the inspection parameters based on pre-defined job settings, allowing for fast and accurate data acquisition. The machine is also equipped with dual output beams and deflection optics, allowing for simultaneous imaging of two parts of the same specimen while preserving a sharp focus. The dual beam optics help ensure precise particle and dust detection on different parts of the specimen. The microscope also provides variable magnification up to 3x, ensuring accurate inspection at various levels of detail. WV 320 also features an advanced edge-detection algorithm which enables it to accurately detect defects and particles on masks and wafers. The edge-detection algorithm can detect irregularities as small as 0.2µm in size, allowing for accurate defect characterization and reporting. The tool also has the ability to compare images of defects and highlight changes over time, allowing users to track progress in an efficient manner. WV320 has optional features such as bright field illumination, dark field illumination, and polarized illumination. These options provide increased contrast and differentiation between particles and defects, ensuring accurate detection. The multi-channel color camera allows for simultaneous imaging in several color channels, allowing users to generate advanced metrics related to particle distribution and sizes. RUDOLPH WV 320 is ideal for semiconductor fabrication, Renewable energy research, and other optoelectronics applications. It is suitable for high resolution imaging and defect/particle detection operations. Its unique features, such as multi-channel color imaging, edge detection, and label-free image analysis, make it an invaluable tool for the accurate and reliable detection and inspection of masks and wafers.