Used RUDOLPH WV 320 #9247834 for sale

RUDOLPH WV 320 is a mask and wafer inspection equipment designed to rapidly and accurately inspect semiconductor masks and wafers. As semiconductor designs become increasingly complex, with denser and finer feature sizes, mask and wafer inspection systems are essential to ensure the highest yields and quality of products. RUDOLPH WV320 is equipped with a 16 million megapixel, high-speed 20-bit image sensor and galvanometric scanning mirror technology to support fast and efficient defect scans. Supporting a maximum field of view of up to 200mm x 200mm, the system optimizes inspection operations with a maximum scan speed of up to 120mm per second. With WV 320's deep focus capability, it can detect even the smallest of defects in the wafer or mask, whether they are at the edge of the field of view or at the bottom of the wafer. The unit also features a broadband detection filter, omnidirectional auto-calibration, and three-dimensional depth derivation for the best possible imaging results. This allows the machine to detect even the most difficult-to-detect defects, such as pinholes, shorts, isolation defects, etc. Furthermore, the tool supports a wide range of inspection scenarios, from 2D-to-3D reconciliation defect detection, front/backside chip alignment to cross-section topography analysis, as well as die-to-die comparison. For maximum reliability and efficiency, the asset also features hot/cold non-volatile RAM, as well as a user-friendly GUI and data storage for repeatable wafer/mask analysis. Additionally, the model is designed to work with a wide range of imaging software including RUDOLPH MaskControl, a comprehensive feature-rich mask and defect analysis and inspection package. In combination with other RUDOLPH mask and wafer inspection systems, WV320 provides advanced inspection with fast and accurate wafer/mask analysis, achieving the highest yields available and ensuring the highest quality and reliability.