Used RUDOLPH WV 320 #9391422 for sale

RUDOLPH WV 320
ID: 9391422
Macro inspection systems.
RUDOLPH WV 320 Mask & Wafer Inspection equipment is an automated, high performance system designed to provide fast and accurate wafer defect detection. The unit utilizes state-of-the-art High Resolution Microscopy (HRM) to automatically assess defects on wafers and other substrates. The machine consists of a mainframe computer, a high-resolution microscope, and a number of imaging systems and detectors. RUDOLPH WV320 Mask & Wafer Inspection tool is capable of detecting a broad range of substrate defects, including open defects, incomplete sample edges, and uneven material thickness. The asset utilizes a specialized camera model and advanced software to image wafers and other substrates at a resolution of up to 10 nanometers. This enables the equipment to detect even the smallest defect on a substrate, allowing for the highest levels of accuracy in defect detection. WV 320 Mask & Wafer Inspection system offers a range of features. It can detect a wide variety of materials, including glass, silicon wafers, and polymer substrates. It also has built-in features such as ion surfacing and selectivity. This allows users to select which specific defect types they want the unit to look for. Additionally, the machine offers three levels of defect detection, including soft and hard defects, as well as mapping of substrate conditions. The tool also offers a number of powerful software capabilities, including automatic job scheduling, substrate verification, and automatic defect inspection. It also features advanced enterprise-level data management, allowing users to search, store, and manage data from multiple sources. The asset is also designed for easy integration with other systems, allowing for the seamless transition of defect information from one model to another. WV320 Mask & Wafer Inspection equipment is designed to make life easier for wafer manufactures and substrate defect assessment professionals. It offers fast, accurate results with minimal user intervention and requires no specialized knowledge or skills to operate. This system is the ideal choice for any wafer fabricator looking to increase their accuracy and efficiency in substrate defect assessments.
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