Used ULTRA OPTICS Mini II #9218885 for sale

ULTRA OPTICS Mini II is a photoresist equipment that uses light from UV and visible sources to create lithography patterns on semiconductor materials. This system is designed for use in research and development labs, and can be used to create micro- and nanoscale patterns on semiconductor wafers. The unit uses photoresist, a light-sensitive material that will only allow chemical reactions to take place where it is exposed to a light source. Photoresist is applied to the surface of the wafer, and then exposed with a mask. The mask is a metal or SiO2 pattern which contains the desired lithography pattern. After exposure, the wafer is developed to reveal the desired pattern. Mini II is capable of exposing a wide range of lithography patterns, and can support a substrate size of up to 8 inches. It uses multiple laser sources ranging from 180nm to 448nm, which can be switched quickly between different wavelengths. This allows the machine to be used for a range of lithography projects and at different resolutions. The tool also features a liquid crystal display which allows for quick and easy readouts. This ensures that the exposure levels are correct and that the correct pattern is produced. ULTRA OPTICS Mini II is a reliable asset that allows for relatively fast patterns to be created without sacrificing quality. It is ideal for research and development labs who need quick, accurate lithography patterns. The model can be used with various photoresist, allowing it to be used for different projects with different resolutions.