Molecular Beam Epitaxy

Molecular Beam Epitaxy (MBE) system, 3"-4" SVT Silicon MBE epitaxial Included: OMICRON Electronics Method: Thin-film deposition of single crystals Transistor: Cellular phones & WiFi Load lock: Chamber with water cooling Quick hatch with O-ring seal & CF copper gasket option GP Model 204 gold seal valve (Roughing line) Sample heater: 200° C Heater power supply: 1000 W Dimension heater control loop Wafer cassette holder, 8" (8) MO Wafer holders, 8" Manual gate valve (VAT) (Between loadlock & intermediate chamber) HPS Series 421 cold cathode gauge & controller (Wide range) Cryopump UHV, 6" Gate valve: Cryopump, 4 1/2" (Pneumatic) (3) Sorption pumps with plastic dawars, heaters & manual valves PIBA Venturi pump with manual valve GP Model 275 convectron gauge with digital controller Vacuum plumbing for roughing Intermediate chamber: (2) Transfer rods: Growth chamber & outgas station Cassette storage elevator (Manual) Ion pump 400 1/8 with PERKIN ELMER 1500 digital controller Sublimator & controller (TSP) Gate valve: Ion pump, 8" (Pneumatic) GP Model 307 extended (3) gauge controllers with ionization gauge 10" Gate valve (Manual) between intermediate chamber & outgas station Rough plumbing with GP 204 gold seal valve (2) Viewports for docking Outgas station: Water cooled chamber with expansion port Viewport with shutter Stage Heater 1100° C with TC Heater power supply: 1000 W Dimension control loop Ion gauge Cryopump, 8" UHV Gate valve,10" (Pneumatic) for cryopump Rough plumbing with GP gold seal valve for chamber Rough plumbing with GP gold seal valve for cryopump Growth chamber: Dia chamber, 24" with water cooling Sample manipulator with Z-motion & 60 RPM rotation Passivated graphite heater, 4": 1100°C Heater power supply: 1000 W (7) Dimension control loops Ion pump 400 1/8 with PERKIN ELMER 1500 digital controller Sublimator & controller: Ion pump (TSP) VAT Valve, 8" (pneumatic): Ion pump Cryropump, 8" UHV Cryropump compressor run (3) UHV pumps, 8" Gate valve, 10" (pneumatic) for Cryropump GP Model 307 Ion gauge controller & gauge (2) Thermionics 156 cc single pocket E-gun with pneumatic activated soft shutter & water shroud L-H 4x7cc Pocket E-gun with pneumatic activated soft shutter & water shroud 15 kW E-beam power supply with (3) sweeps (4) Standard 20cc (K-Cells) effusion cells (2) High temperature 10cc (K-Cells) effusion cells (4) Power supplies 1000 W for Std K-cells (2) Power supplies 1600 W for high temperature K-cells (6) Water cooled effusion cell shrouds with pneumatic activated soft shutters (10) Loop dimension multi-loop controllers with relay & CPU interface SVT Shutter controller (2) Sentinel III flux sensors & X'tal sensor with additional beam splitter Sentinel III deposition controller RHEED System with power supply, shutter, screen, lead window, & controller Option: VIEETECH 30 key / KIMBALL PHYSICS 20 kev RGA UTI-l00C System with TEKTRONIX 5111A scope & 5A 15N & 5B1 on plugins Movable ion gauge: Flux control Master shutter (Pneumatic) Rough plumbing & gold seal valves: Cryropump Bakeout heaters, timer, fans & soft blanket Viewports & shutters required: Docking & E-guns (Reference port schedule) (2) Implanter port soft shutters System upgrade chambers, 8" / Manipulator, stages & valves (6) PBN STD Crucibles (2) Hi-temp crucibles CPU 386/20 MHz IBM Compatible with hardware Water distribution panel System console Rough plumbing with GP gold seal valve for main chamber Gate valve, 10" (Manual) isolate growth chamber from intermediate chamber.

MBE Growth system R&D Epitaxial layers on substrates diameter, 3" GEN10™ growth chamber, 3" High-efficiency solar cells High-temperature superconductors Includes: GaGs Nitrides Oxides Direct scalability: GEN20™ GEN200® GEN2000® Capabilities: Extreme high temperature heater (>1850°C) Multiple E-beam source deposition Wafer holder exchange and/or flip Retractable sources System integration: Isolated preparation chamber Multi-system with dissimilar materials VEECO Legacy systems (GENII/GEN930) Atomic layer deposition Metrology (STM, Auger, ARPES, etc.) Platforms: GaAs Nitrides Oxides II/VI.

Molecular beam epitaxy system, 3" Type: Cell in: 60cc Dual filament ga cell: 125cc Cell cable 2-pol, TC (2) Cryo motor cables (4) Water pipes Pistols: N2 Cracker (With motor) (2) Trolleys, WH (5x 3'' 2x 2'') (2) End piece manipulators Buffer chamber extension Materials used: As, Ga, In, Al, Si, Be Connector vacuums: LN2 Cables joint Shutters tangen Cage distance pieces Power cable Doping cell (Si) Ga cell sumo Pyrometer Control unit Power cable Doping cell (Neu) Si-cell heat filament defect Head mass spectrometers: Lead through defective Al-cell thermo couple defective (2) Windows (Heated) Control-PC Cage Ratchet Dual filament cell 400g Sumo cell Dual filament cell (EPI 91-602) Dopant cell (EPI 95-2284) Mass spectrometer Control-PC Cage distance pieces (4) He-tubes Power cable LN2 Phase separator.

MBE System.

MBE System (3) Wafers: 2" Single: 4" Single: 3" Single: 2" / 3 x 2" 1999-2002 vintage.

MBE Growth chamber For eBeam deposition of metals With loadlock VEECO GEN II Manipulator Includes: (2) THERMIONICS LAB INC / TLI HM2 Series eGun TM (2) 10cc Crucibles with 8" OD CF mounted (2) Pneumatic shutters (2) Water interlock switches Switching e-Gun power supply: 15kW Gun controllers filament transformer & cables (2) X-Y Beam sweep controllers Flux monitor sigma EIES guardian Optitherm III Optical fiber pyrometer Range: 600°C to 1500°C RHEED kSA 400 With 30eV power supply STAIB Gun computer control package With remote control box VEECO CAR 3" Dual zone With heater Power supplies Controller Substrate rotation Angle to evaporation / Loading Atomic hydrogen source with automated valve positioner (3) Chillers: Sample & H+ source cooling Main chamber cooling Chamber and E-Gun cooling Leak valve LVM940 (Lesker) High accuracy: 10e^-3 to 10e^-11 With sample tank quick connection With vacuum connection (2) PCs Equipment racks Pumps: OXFORD INSTRUMENTS Cryo-Plex 8 UHV With burst disc Holding system at 10-kelvin PFEIFFER MVP 070-3 Diaphragm vacuum pump PFEIFFER Mechanical-turbo pump DCU GAMMA Vacuum ion pump 150T Titan DI (6) CFF VAT Valve Meter: (2) MKS 999 Quattro EXTORR XT100 Residual gas analyzer GRANVILLE PHILLIPS 350 Ionization gauge & controller Does not include MKS Microvision 1-6AMU RGA Manuals.

MBE system, 2" Has been decontaminated.

MBE Growth system Applications: Grow lasers Sources: 2"e. Wagon wheel prep chamber with Auger analysis Auxiliary chamber Growth chamber Manual valve Ion-pumped 4-effusion cell system (8) 2" Effusion cells (4) Upward-looking effusion cells All GaAs: InALGaAs based materials with Si and Be dopant sources (3) Ion pumps at the base (2) Sorption pumps Functional RHHed and QMS Spare parts and effusion cells available No phosphorous deposited 6-wafer load lock O2 Plasma source H2S Cracker cell H2S3 Cracker cell Eurotherm temperature controller System operation software and computer 1984 vintage.

MBE Growth system Chamber with (8) source flange size 4.5” each Sources: Al, Ga, In, Be, Si, GaTe, As, Sb (2) Ion pumps: Main chamber (600 l/m) Preparation chamber (400 l/m) with (2) power supplies CTI8 Cryo pump for main chamber 6” Turbo pump with dry pump for load lock (2) Ti-Sublimation pumps With power supplies in the base of the main chamber 2" or 3" Sample manipulator with servo motors for rotation Position setting Control unit Beam flux monitor Controller Sample manipulator heater with power supply Temperature controller and display (3) Ion gauges: With (3) power supplies and controllers Main chamber Preparation chamber Load lock Load lock for 4-10 wafers With (1) heater for pre bake out at 150 C With its power supply Temperature controller Preparation chamber With (1) heater for bake out at 400 C With its power supply Temperature controller Electrical distribution panel Bake out panels with electrical connections (8) Shutters with their control units Utility distribution box for water, air, N2 QMS and RHEED with power supplies Operating system and computer (latest version of Moly, or AMBER, or EPIMAX) 4-6 sample holders All gaskets will be silver coated copper gaskets Pyrometer RHEED Camera and analysis software Turn key project Effusion cell: 4.5” flange Dual or single heater up to 1350 C 85-155 CC PBN crucible Power supply Temperature controller.

MBE System.

Molecular beam epitaxy system.

MBE System Chamber with (8) source flange size, 2.75” MBE Components: RHEED System Sample manipulator with flux monitor QMS Head Glove box Pumps: Cryo pump Lon pump Turbo pump (2) Ion pumps: Main chamber (600 l/m) Buffer chamber (150 l/m) with (2) power supplies (2) Ti-Sublimation pumps With power supplies in the base of the main chamber Manipulator, 2" With servo motors for rotation Position setting Control unit Heater power supply Thermo-couple controller Beam flux Monitor and controller (2) Ion gauges: With (2) power supplies and controllers Main chamber Load lock Load lock for 6 wafers With heater for pre bake out with its power supply Temperature controller Electrical distribution panel Bake out panels with electrical connections Eight shutters with their control units Utility distribution box for water, air, N2 QMS, Power supply & display unit Operating system and computer (6) Sample holders Baffles head for main chamber turbo pump Gaskets silver coated copper gaskets Mixing manifold With (2) leak valves and tubing for gas interceptor Sulfur automatic valved cracker with: (2) Temperature zones 100 CC Quartz crucible (2) Power supplies (2) Temperature controllers Servo motor and controller and cable Oxygen plasma source with: RF Power supply Matching unit Leak valve Water flow meter and filter High temperature effusion cell with: Temperature zone up to: 2000°C 10 CC Crucible Power supply & temperature controller Low temperature effusion cell with: (2) Temperature zones (Base and tip) 25 CC PBN Crucible (2) Power supplies (2) Temperature controllers Gas injector with: Single heater Power supply Temperature controller and display Mixed manifold with two leak valves and tubing Options: QCM Integrated With machine for film thickness monitor RHEED System With 6" phosphorous screen and detector and camera E-beam gun with power supply and control unit.

System SS Chamber: O-ring sealed cover & has a 1 ½" viewport (2) sets of Curvac ports around the circumference Upper set of ports include four 2 ¾" and three 3-3/8" Curvac flanges Pumping system: (2) Ultek sorption roughing pumps including manifold & manual valving Veeco MI300 Mag Ion pump rated at 300 l/s complete w/ Model CU510 power supply Mounted on a compact table.

Reactor, 5", 2" x 1 Solid source :Si, Al, Ga, In×2, Be×2 Gas source: AsH3, PH3 Chambers: entrance, transfer, growth PHEEd, PYRO, LN2 liquid separate Scrubber for gas.

MBE System Growth: GaAlAs (III-V compounds) Under vacuum Single wafer system, 2" Includes: Spare modules Vacuum pumps Reed / Auger attachments Manuals Spare parts 1982 vintage.

MBE System.

MBE System MBE Switching unit Low vacuum gauges Low vacuum and loading chamber vacuum measuring unit Loading chamber Magnetic-discharge pump Technological chamber with (8) molecular sources With diffractometer screen Units for residual gases control Backside equipment with idle cryo-pump Molecular sources control unit (Left) Manual cover sheet 1982 vintage.

MBE Growth system Combination of IV: Si / Ge / Sn Ports, 2.75" Chamber 1 (III-V): Arsenic valved cracker Indium effusion cell Gallium effusion cell Aluminum effusion cell Ga downward looking source Silicon effusion cell (5 cc) Beryllium effusion cell (5 cc) Chamber 2 (Group IV): Germanium effusion cell Silicon e-beam source Silicon high temperature source Tin effusion cell Arsenic valved cracker Boron dopant source.

MBE System.

MBE System P/N: 981-4001.