Used CUSTOM / NEXGEN 440 S1 MBE #9233063 for sale
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ID: 9233063
MBE Growth chamber
For eBeam deposition of metals
With loadlock
VEECO GEN II Manipulator
Includes:
(2) THERMIONICS LAB INC / TLI HM2 Series eGun TM
(2) 10CC Crucibles with 8" OD CF mounted
(2) Pneumatic shutters
(2) Water interlock switches
Switching e-Gun power supply: 15 kW
Gun controllers filament transformer & cables
(2) X-Y Beam sweep controllers
Flux monitor sigma EIES guardian
RHEED kSA 400
With 30eV power supply
STAIB Gun computer controller
With remote control box
VEECO CAR 3" Dual zone with heater
Power supplies
Controller
Substrate rotation & angle to evaporation / Loading
PFEIFFER MVP 070-3 Diaphragm vacuum pump
PFEIFFER Mechanical-turbo pump with DCU
(2) MKS 999 Quattro
EXTORR XT100 Residual gas analyzer
GRANVILLE PHILLIPS 350 Ionization gauge & controller
NESLAB HX300 E-Guns chiller
OXFORD INSTRUMENTS Cryo-Plex 8, Diode, UHV with burst disc
PFEIFFER MVP 070-3 Diaphram vacuum pump
Holding system at 10-kelvin
Chamber & E-Gun cooling
Manuals
Does not include:
MKS Microvision 1-6AMU RGA
Atomic hydrogen source with automated valve positioner
Chiller for sample & H+ source cooling
Chiller for main chamber cooling
LESKER LVM940 Leak valve
PC System
(2) XHR 60-18 XANTREX power supplies
(3) EUROTHERM controllers
Optitherm III Optical fiber pyrometer
Temperature range: 600°C to 1500°C
GAMMA Vacuum ion pump
150T
Titan DI
(6) CFF
VAT Valve.
CUSTOM / NEXGEN 440 S1 MBE equipment is a state-of-the-art molecular beam epitaxy system that is utilized in the study of growth and characterization of ultra-thin (thickness less than 1μm) semiconductor films. It is a versatile, Multi-barrier epitaxy unit with an upgradable configuration and includes components such as a load-lock chamber, sputtering kit, e-beam gun, heating elements, dual-source deposition with source-mixed mode, and an ultrahigh-vacuum (UHV) integrated machine controller. The load-lock chamber is used to minimize gas introduction and contamination and maintain a stable UHV in the main vacuum chamber. This also enables deposition of multiple test samples in the same campaign. The sputtering kit allows for the study of metals such as titanium, silver, molybdenum, and palladium by using a multi-pocket target. The e-beam gun is also used to evaporate substrate materials as and when required. Additionally, the heating elements are employed to assist in growing more intricate structures such as bilayers, while the dual-source deposition ensures precise composition and layer profile of deposited material in a source-mixed mode for multi-alloy structures. Apart from these, CUSTOM 440 S1 MBE tool also utilizes a powerful UHV asset controller. This allows for automated operation and precise control of all vacuum and deposition parameters, data logging, time-dependent operational control and much more. This also offers real-time parameter monitoring, both for model status and the material deposition, to ensure accurate experiments and accurate results. In addition, the source-mixed mode dual-source deposition enables better control over layer profiles, temperature, composition, and facilitates further manipulation of the deposited material, such as with anisotropic etching. Moreover, it also offers better precision in the growth of complex structures such as quantum dots. In short, NEXGEN 440 S1 MBE equipment is an advanced tool used to study material growth and characterization of ultra-thin films. It utilizes a versatile multi-barrier system, with an integrated UHV controller, various heating components, sputtering kit, and a powerful e-beam gun. With its sophisticated design, it provides precise control over deposition parameters and layers, and offers advanced tools for etching and manipulation of deposited materials. This makes it ideal for research and development of materials for nanodevices and electronic applications.
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