Used OMICRON SVT 440 #9388547 for sale

OMICRON SVT 440 is a molecular beam epitaxy (MBE) equipment used to grow high-quality crystalline thin film materials at the molecular level. The system features an in-situ shutter assembly, a four-pocket source, an opto-mechanical stilling chamber, and a particle filter. The assembly is designed to provide a consistent, high-quality thin film deposition over a large area with minimal processing times. It has a vacuum chamber with a capacity of up to 150 mbar and a temperature range from 100 to 400ºC. The unit allows for the precise control of substrate heating temperatures and electron bombardment during plasma etching and deposition processes, and can be used for a variety of applications including semiconductors, nitrides, oxides, metal-oxides, carbon nanotubes, and dielectric layers. The chamber has a large field-of-view, allowing for precise deposition and alignment during fabrication. SVT 440 is also equipped with an RF plasma source for nitrogen incorporation, and a closed-cycle cooling machine with 24/7 temperature control. It is one of the most reliable thin-film deposition systems available, and has been proven to have excellent uniformity, reproducibility, and repeatability. The tool has an user-friendly touchscreen interface with multilingual support and software that allows for complex process recipes to be programmed for optimized deposition precision. It has an integrated safety asset that ensures predictable and reliable operation with continual monitoring. OMICRON SVT 440 is an excellent choice for those seeking to deposit high-quality films with reproducible features at the molecular level. With its advanced heating temperatures, electron beams, and precision deposition capabilities, SVT 440 is a cost-effective, reliable model for thin-film deposition on a wide variety of substrates.