Used OXFORD VG 80 #9121715 for sale

OXFORD VG 80 is a high-performance Molecular Beam Epitaxy (MBE) equipment for the growth of III-V compound semiconductor structures. Utilizing advanced technologies, it is designed especially for the deposition of specialized materials with precise control of layer thickness, doping level, composition and interface. The system comprises two main components: the source chamber and the growth chamber. The source chamber is equipped with MBE-class effusion cells, ion guns, shutters, and other components. These optimized, ultra-high vacuum components deliver extremely precise vapor flux to control the quality of the deposition on the substrate. By using several sources, users can achieve high-level control of layer composition and doping for custom materials. The second component of the unit is the growth chamber, which consists of a high-temperature platen with a temperature range of 300°C-900°C and a sophisticated automated substrate handling machine. This tool provides the ability to monitor in-situ growth of thin-films and microstructures. Furthermore, a precise RHEED asset is available and enables users to monitor film growth in real time. The model is also equipped with a Load Lock equipment for sample introduction into the vacuum chamber. This ensures smooth and efficient sample loading and unloading procedures. In conclusion, VG 80 is a versatile platform for the growth of optimized III-V compound semiconductor structures and materials. Its components enable precise control over material properties, thus enabling users to create specialized materials that are tailored to their exact needs. As such, OXFORD VG 80 system is an invaluable tool for researchers in the semiconductor industry.