Used OXFORD / VG SEMICON V100 #9036615 for sale
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ID: 9036615
Wafer Size: 5x3"
Vintage: 2010
3-Stage Molecular Beam Epitaxy (MBE) System
Currently configured for 5x3" wafers
Other capabilities : 1x6", 3x4", 5x3" or 12x2" substrate wafers at a time
CBr4 Source
Deposition chamber
Preparation chamber with (2) fast entry locks
Outgas stage
System bench
Control rack
Computers
Custom control software or OEM
Control Rack Modules
UHV Pressure Controllers
Shutter Controls
Valve Controls
Transfer Controls,
Pumpdown / Vent Controls
RHEED Gun Supply
RGA and temperature monitoring
4- Loop Thyristors
UPS Interface
Multi-Gauge,
Autoranging Picoammeters
(1) SRS RGA200 Quadruple Mass Spectrometer
(1) Applied Epi RF Plasma Source Tuning Unit
(3) Powerware Prestige EXT UPS Supplies
(1) Neslab CFT-150 Recirculator
(1) CTI 9600 Compressor
(3) Busch Diaphragm Pumps
(4) Heavy-Duty Transformers
Liquid Nitrogen System Components
Continuous power supply battery back up
LN2 phase separator
Controllers
Pumps
Manuals
415V, 50/60Hz.
OXFORD / VG SEMICON V100 is a sophisticated molecular beam epitaxy (MBE) equipment, designed for advanced thin film deposition processes. It utilizes the technology of high vacuum, low pressure and ultra-high vacuum combined with a highly reliable host of application specific process technology. OXFORD V100 offers a range of process capabilities, such as expanded area patterning processes, conduction layer growth processes and high quality surface finishes. These processes are based on techniques of molecular beam epitaxy, where a thin film of a desired material is deposited upon a substrate at an ultra-high vacuum chamber. The substrate, heated to the appropriate temperature, is exposed to the incident beams of precursor molecules that evaporate at using high intensity electron beam and other sources. VG SEMICON V100 provides two isolated ultra-high vacuum chambers for reliable and repeatable process uniformity, both of which are equipped with different sets of process modules to ensure optimum control of the desired parameters such as deposition rate, background pressure, substrate temperature and more. It also features electrical modules, a heating module and a powerful thermocouple module to accurately monitor and regulate the temperature uniformity inside the chamber. V100 has a host of advanced process control features. This includes a multiple gas-injection system, which allows for the delivery of multiple gases for a wide range of gases in a highly controlled manner, automatic flow control of gases, controlling the intensity and size of the electron beam, and a range of process parameters to accurately monitor the process startup, stabilization and termination processes. OXFORD / VG SEMICON V100 is the perfect choice for users who need a high-precision, advanced and reliable MBE unit for thin film deposition. The features of this machine allow for an expanded range of application capabilities such as semiconductor production, drug and biotechnology production, advanced electronic, opto-electronics, flat panel display, among others. The enhanced process control provided by OXFORD V100 ensure a reliable and repeatable deposition of absolutely high quality films.
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