Used RIBER 19C #9100829 for sale

Molecular Beam Epitaxy (MBE) is a sophisticated process technology used to deposit thin film semiconductor layers on substrates for optoelectronics and other microelectronic devices. RIBER 19C is a MBE equipment based on the Knudsen effusion cells technology built by RIBER S.A., a French MBE systems manufacturer. 19C system includes three base components: an ultra-high vacuum (UHV) chamber, a user-friendly control software package, and a range of source modules. The UHV chamber is designed for reliable and efficient operation, with a quartz viewing window, mechanical gauge controllers, and an advanced thermocouple unit that can measure the temperature of each source to within 0.1~ K. Integration with third-party furnaces makes it possible to produce a broad range of semiconductor layers on different substrates. The user interface of RIBER 19C's software package provides an easy and reliable way to control the machine. Featuring a touch screen and graphical user interface, it enables the user to adjust flux rates, turntable angles, temperature, pressure, tare weights, and operation parameters. Furthermore, the software package includes a customizable data logging and automation capability, allowing for remote or autonomous operation. 19C also features an advanced range of source modules. Its two-valve, four-gas source module enables accurately regulated flows of gases in multiple valve/gas combinations. It is capable of controlling up to six gases with 16 individual valves enabling dosage control of precise molecules. Moreover, its patented rotating shutter source module enables users to continuously deposit films without altering the number of valves in the mix, for precise control of film properties. In addition, its three filament source module allows for a wide range of temperatures to be accurately controlled and maintained. This tool is commonly used to deposit a wide range of materials ranging from elemental compounds (such as arsenic compounds) to III-V compounds. Finally, its resistance-heated source module gives the ability to precisely transfer volatile materials such as III-V and II-VI compounds without decomposition. Overall, RIBER 19C is an advanced MBE asset well-suited for the production of high-performance and reliable thin film semiconductor layers. It provides a reliable and efficient UHV model, user-friendly software package, and a wide range of source modules for accurate and precise control of layer properties. This equipment has been successfully used in the fabrication of various optoelectronic and microelectronic devices.