Used RIBER 304 #9153862 for sale

Molecular Beam Epitaxy (MBE) is a versatile and powerful method of creating epitaxial thin films of materials with well-defined crystal structure. RIBER 304 is a state-of-the-art MBE equipment that has been designed to meet the highest requirements of both research and industrial applications. The system features optimized uniformities and homogeneous layer growth with the highest quality. 304 is composed of several components including the generator chamber, the sample chamber, a shutter unit and the vacuum machine. The generator chamber consists of a series of effusion cells connected to a turbo pump, which provides the necessary vacuum environment. The cells are electrically heated and feature two typos of ovens, one for the growth of III-V compounds and the other for the deposition of noble metals. The sample chamber is equipped with an eight-pocket sample holder, a retractable mirror and a gas-injection tool. The shutter asset is the main control unit of the model, allowing precise dosing of each material needed for MBE deposition. It includes separate actuation devices for both materials and also provides visual feedback on the heating status of the ovens. Moreover, its versatile control software offers a wide range of options to fine-tune the shutter equipment. The vacuum system is composed of an ion source vacuum pump, an array of rotary pumps, an ion-pump controller and an ionization gauge. This robust and efficient vacuum unit ensures extremely low process pressures (<5 x 10^-10 Torr) and an excellent background vacuum (<1 x 10^-11 Torr). RIBER 304 MBE machine also features a remote computer, which is used to monitor and control all the tool components, from the shutter asset to the vacuum model. This computer is a key component for Researchers, it provides access to a range of specialized tools such as a real-time preview of the process pressure, growth rate and other operating parameters. In conclusion, 304 is an advanced MBE equipment that combines high performance, reliability, and flexibility. It allows the deposition of epitaxial thin films of desired materials with great control and exact homogeneity, essential in many research and industrial applications.