Used RIBER 32 #9278911 for sale

Molecular Beam Epitaxy (MBE) is a deposition technique employed to produce high quality thin films and nanostructures. RIBER 32 is a compact and easy to use MBE equipment that offers a wide range of exposure capabilities, making it suitable for various types of applications. It includes three sources of gallium, arsenic, and nitrogen, appropriate for a number of different applications. It also includes an additional source of arsenic to expand the deposition range. The sources are independently controllable, allowing the user to adjust the concentration of deposited elements in the thin films. The system has a growth chamber with multiple levels and is equipped with a quartz crystal microbalance (QCM), which allows for precise control of the thickness of the deposited layer. The growth chamber is temperature-controlled and can reach up to 800 °C, enabling different growth conditions for a wide range of materials. Additionally, there is an integrated in-situ optical monitoring unit for the observation of the growth process. 32 also offers multiple configurations for deposition. It can be operated in direct or remote mode. In direct mode, the sources are facing the growth substrates and the depositions can take place in a variety of atmospheres including UHV, chamber pressures of up to 2x10−5 mbar, Ar-bearing gases, and in controlled oxygen or O2/N2 atmospheres. In remote mode, the sources are placed away from the growth substrates enabling the deposition of thicker films. These features and capabilities make RIBER 32 an excellent choice for a variety of thin film deposition applications including research and development in the field of advanced materials, technology and device fabrication. Additionally, the user-friendly design and safety features make the machine convenient and easy to use. With a comprehensive set of quality assurance tools and diagnostics, 32 promises industry-leading deposition and growth performance.