Used RIBER 49 #9307797 for sale

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Manufacturer
RIBER
Model
49
ID: 9307797
Wafer Size: 8"
Vintage: 2001
Molecular beam epitaxy system, 8" Materials: Indium, GaAs, Aluminum Operated with programmable shutter controller Max substrate temperature: 1000°C Manipulator: LN2 Cooled As and Sb Crackers included (16) Supplies for cells (3) Prep chamber heater and manipulator (3-4) Spare controllers (2) Ports: 3"-6" 7"-8" 2001 vintage.
Molecular Beam Epitaxy (MBE) is a technique used to grow layers of compounds or atoms on a substrate surface in order to form high-quality interfaces with electronic and optoelectronic properties. RIBER 49 is a state-of-the-art MBE equipment designed to produce high quality epitaxial layers in a versatile and cost-effective manner. The system is capable of multi-source deposition, enabling deposition of various materials from up to 10 independent sources. This allows for the deposition of very complex materials such as complex alloys, superlattices and nanostructures. The unit is equipped with a range of sources, including high-efficiency sources for fast deposition, electron cyclotron resonance sources for high-temperature deposition, and ultra-low-pressure sources for ultra-high-vacuum deposition. Additionally, 49 is capable of operating at a range of substrate temperatures, allowing for optimization of lattice matching and more complex growth techniques. The machine is equipped with a real-time monitoring tool, which allows for temperature and pressure control and process parameter optimization in real-time. To ensure growth quality, the sample chamber is equipped with an advanced gas injection asset that enables the introduction of ultra-pure gases for high-temperature growth. This allows for greater control over surface oxidation and other environmental effects. Additionally, the model is equipped with a range of diagnostic tools, such as an optical microscope, a wedge cleave profiler, a secondary-ion-mass-spectroscopy and a scanning-electron-microcopy. These can be used to monitor the growth, enabling the enhancement of deposition parameters in real-time. RIBER 49 allows for extremely precise deposition of ultra-high quality epitaxial layers. It offers high performance, flexibility and cost effectiveness, making it ideal for research laboratories and universities. With its wide range of features and capabilities, 49 can be used for a variety of research and fabrication applications and can provide unmatched growth quality for a variety of application needs.
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