Used RIBER 49 #9395706 for sale

RIBER 49 is a molecular beam epitaxy (MBE) equipment manufactured by RIBER SAS. MBE is a method of producing high quality single- crystal thin films in a controlled atmosphere, on the microscopic level. It is used in the semiconductor and optoelectronics industries for the production of various materials such as silicon, gallium arsenide, gallium nitride, and indium phosphide. Additionally, 49 can be used for the fabrication of graphene, transition metal oxides, and quantum dots. RIBER 49 consists of four main components: an Ultra High Vacuum (UHV) chamber, an Ultra High Vacuum Station (UHVS), an electron beam evaporator, and a growth monitor. The UHV chamber is designed to operate with a vacuum pressure of 1x10-9 torr. This provides a very clean environment for the formation of single-crystals and eliminates contamination from air and other molecules in the atmosphere. The UHVS is the main control unit which houses all of the system components and provides easy access to the chamber for sample manipulation. The electron beam evaporator is used to control the deposition rate of the source material onto the substrate and to reduce off-axis diffusion. Lastly, the growth monitor provides real-time data about the crystal growth process, such as the pressure, movement, and temperature of the UHV chamber. 49 is very efficient and cost effective compared to other MBE systems, as it can produce high quality thin films in a fraction of the time. Additionally, the UHVS provides accurate pressure control and temperature regulation within the UHV chamber, while also providing a powerful display and reliable control unit for the user. RIBER 49 can process substrates up to 4-inches in diameter and can accommodate multiple configuration and control designs. The machine is highly adaptable and can be used to fabricate a wide range of materials and structures. Finally, the built-in software of 49 provides an easy-to-use interface, allowing users to monitor data of the crystal growth process in real-time. In conclusion, RIBER 49 is an efficient and cost effective tool for the production of single-crystal thin films in a controlled environment. It is well-suited for the semiconductor and optoelectronics industries and can be used for the fabrication of a wide variety of materials. Additionally, the built-in software provides an intuitive interface with real-time data, allowing for precise and accurate control over the entire process.