Used VARIAN CP738407 #293644168 for sale

Molecular beam epitaxy (MBE) is a widely used technique for the fabrication of semiconductor materials. VARIAN CP738407 is a state-of-the-art molecular beam epitaxy (MBE) equipment, specifically designed to support modern research and process development needs. It is engineered to address the needs of advanced research in a wide range of industries such as electronics, photonics, and biophotonics. The MBE system features a process chamber that provides a vacuum tight environment for the deposition of layers on a substrate. The chamber has various inlets and outlets to regulate the deposition rate of different chemical precursors and other process gases. CP738407 unit is equipped with a highly sensitive resistive flow sensor to accurately measure carrier gas flow. The machine allows for precise control of background pressures, temperature, pressure and other process parameters. The tool also includes an integrated temperature feedback asset for highly precise temperature control of the substrate. In addition, the MBE model includes advanced control and monitoring systems, including advanced fault detection, logging, and archiving capabilities. The MBE equipment utilizes an integrated robotic arm to handle the substrate tray and provide sample loading and unloading. The robot arm is outfitted with a motor-driven positioner and is equipped with a linear and rotary load lock.This allows for precise movement of the samples and makes VARIAN CP738407 ideal for high throughput production and R&D processes. CP738407 MBE system is designed to help researchers, developers and manufacturers fabricate high-performance semiconductor materials with greater accuracy and control than ever before. Its integrated vacuum unit, advanced control and monitoring capabilities, and highly precise temperature control combine to create a machine that offers the best in performance, precision, and repeatability. With its unique combination of features and versatility, VARIAN CP738407 is ideally suited for a wide range of applications, from wafer fabrication to resource efficient device development.