Used VARIAN / INTEVAC GEN II #9168496 for sale

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ID: 9168496
Wafer Size: 3"
Molecular beam epitaxy (MBE) system, 3" Si, Ge, Ga, C (gas source) Growth of Si-compatible materials for optoelectronics (8) 4.5" Source ports.
VARIAN / INTEVAC GEN II Molecular Beam Epitaxy (MBE) equipment is a powerful and versatile tool for the deposition of thin films with precisely defined properties. It is designed to generate unique, nanometer-scale, crystalline structures for advanced device applications. VARIAN GEN II MBE system utilizes molecular beam technology and offers a wide range of gas sources and beam energies for the growth of a variety of materials, including traditional and exotic compounds. INTEVAC GEN II MBE is designed to accommodate up to six sources, four of which are DC magnetron sputter sources. Each magnetron source can be loaded with a variety of materials such as metals, insulators, and semiconductor compounds. In addition, the unit has two beam-type sources that are suitable for more exotic materials, such as indium phosphide. Each source can also be operated over a broad energy range, from 50 to 150 eV, to enable optimum control over the deposition rate and material quality. GEN II MBE machine has a fast, flexible substrate transport tool which can accommodate up to twelve 2-inch diameter substrates. In addition, the asset can hold up to four 3-inch diameter substrates for large area deposition applications. VARIAN / INTEVAC GEN II MBE is designed to provide high-precision growth control coupled with an advanced user interface. The model can accommodate precise control of the deposition rate and layer thickness, as well as the composition and texture of the layer being deposited. In addition to its MBE capabilities, VARIAN GEN II MBE also includes a state-of-the-art online characterization suite. This suite enables thin film analysis and evaluation through a variety of techniques, including x-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM), as well as electrical property measurements. INTEVAC GEN II MBE equipment offers a powerful tool for the fabrication of advanced devices and structures with nanometer-scale precision, coupled with advanced characterization capabilities. The combination of these features make GEN II MBE system suitable for a variety of research and commercial applications, especially those involving ultra-thin layers.
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