Used VARIAN / VEECO GEN 2000 #9064832 for sale

VARIAN / VEECO GEN 2000 is a molecular beam epitaxy (MBE) equipment used in the fabrication of high-end semiconductor materials. This VEECO system provides users with a highly precise method for the growth of atomically thin layers of high-quality thin films. This allows for enhanced semiconductor property control and device performance. The MBE process begins by passing a beam of high-temperature molecular particles through a tube, where it is interacted with a substrate material to deposit an even, atomically thin layer of material onto the surface. This VARIAN unit is equipped with an advanced set of components, each designed to reduce contamination risk, control growth rate, and produce uniform layers. This includes features such as high-purity carbon arc-lamp source, an e-gun capable of global bombardment of substrates, a 10-zone furnace with independent heating and cooling capabilities, and multiple gases for growth control. VARIAN / VEECO machine is highly versatile and can be programmed to suit the user's requirements. It offers variable power intensities from ultra-low to high power, spanning short-time to long-time operation, and allows for growth of layers of different materials over a wide range of temperatures. It is also designed to provide excellent substrate orientation control and motion systems which are able to apply homogeneous substrate motion along the growth plane. VEECO GEN 2000's data acquisition systems also offer users unprecedented control over their thin film layers, providing accurate and real-time data on rates of growth and deviations from ideal process parameters. VEECO tool interface integrates a large interactive graphical display, software-controlled communication, and multiple digital inputs and outputs, giving users complete control over their processes. In summary, VARIAN asset VARIAN GEN 2000 offers unparalleled precision and accuracy in the growth of high-end semiconductor materials. The wide array of components, coupled with the advanced data acquisition and programmability features, provides users with complete control over the growth of thin film layers for improved device performance.