Used VARIAN / VEECO GEN II #9215068 for sale

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ID: 9215068
MBE System P/N: 981-4001 Includes: Main chamber Electronics rack Plate Removed parts: RHEED Gun Source cells Transfer arms.
VARIAN / VEECO GEN II is a type of molecular beam epitaxy (MBE) equipment that is designed for high quality thin film growth in a variety of applications. It uses a vacuum chamber and a combination of beams of electrons and particles of elements, such as silicon and gallium, to grow atomic-layer thin films of these materials. VEECO GEN II is unique, because it utilizes a unique technique called E-beam evaporation to deposit thin films of material. This E-beam is created when an electric field is applied to the material, causing the molecules of the material to be ionized or accelerated in a beam of particles. The thin film growth process begins with the material being pumped into the vacuum system. This material forms a source material and is heated to a specific temperature, which allows atoms to be stripped from the surface of the source material. Simultaneously, the E-beam directs and controls the deposition of the source material onto a substrate where the thin film grows. As the film increases in thickness, the growth can be modulated by introducing additional elements (dopants) into the unit, which affects the properties and the electrical characteristics of the thin film such as stress, resistivity, band gap, and the dielectric constant. VARIAN GEN II also features two vacuum pumps, and a VEECO Opticron imaging machine, which allows users to monitor the growth of the thin film. It also includes a surface analyzer, which is used to measure the surface quality of the sample and a Load-Lock tool that allows the sample to be processed using higher deposition rates, higher quality, and repeatable experiments. GEN II is a state-of-the-art MBE asset that can help scientists and engineers create high quality thin films for a variety of applications ranging from microelectronics to solar energy. It is an invaluable tool for those looking for high-quality thin film growth for their projects and has been used for a wide range of studies, including measurements of strained thin film structures, interface studies, doping studies, and so on.
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