Used VARIAN / VEECO GEN II #9225851 for sale

VARIAN / VEECO GEN II is a molecular beam epitaxy equipment that provides a reliable way to produce high-quality thin-film semiconductor materials. The system is composed of a vacuum chamber, where the reaction takes place, and a series of independent, yet interrelated, components. The chamber includes a substrate chuck, laser heating source, a shuttering mechanism, a gas controlling unit, deposition heads, and a rapid quenching device. Through the substrate chuck, a substrate sample such as a silicon wafer, glass plate, or a gallium arsenide wafer can be secured. The laser heating source can be adjusted to a desired temperature of up to 1000°C, generating enough heat for advanced epitaxial growth. The shuttering mechanism allows for precise control of the reactant beam and works in conjunction with the laser heating source, allowing for even distribution of heat throughout the substrate. The gas controlling machine uses a separate gas box, allowing for the deposition to occur at low vacuum pressure. This ensures an effective MBE process with minimal contamination and minimal surface roughness. The deposition heads can be tuned to provide almost any desired composition of the epitaxial film. The fabricated layers can range from nanometers to micrometers, depending on the needs of the user. The rapid quenching device works like a shutter, quickly and precisely stopping the film deposition in order to avoid unwanted interactions and ensure uniform film deposition. VEECO GEN II provides a reliable and accurate way to produce high-quality thin-film semiconductor materials. Additionally, this tool can produce layers of different thicknesses, compositions, and surface roughness needed for advanced epitaxial growth. In short, VARIAN GEN II is an ideal solution for users needing precision and reliability when producing thin-film semiconductor materials.