Used VARIAN / VEECO GEN II #9225866 for sale

VARIAN / VEECO GEN II is a molecular beam epitaxy (MBE) equipment, which is used for the production of high-precision, single-crystal thin films of compound semiconductors with superior purity and atomic-scale control of the film thickness. VEECO GEN II is equipped with two effusion cells - one for group III elements and the other for group V. The cells are mounted on a three-axis manipulator for optimizing substrate temperature and flux. The substrate is heated to a temperature of up to 750°C, while a shutter is used to interrupt the flux from the effusion cells independent of the manipulator. The system is also equipped with a Reflection High Energy Electron Diffraction (RHEED) unit that allows for on-the-fly flux rate and geometry optimization. This allows for better monitoring of the growth and ensures higher quality of the final product. In addition, VARIAN GEN II has a low-energy ion source which helps reduce defects in the film. GEN II also features a quadruple-chamber vacuum oven that enables efficient film growth while maintaining a clean and ultra-high vacuum environment. The four chambers are connected through load-lock ports to a vacuum degassing chamber. This chamber is then connected to a turbomolecular pump and turbo-drag pump combination, which provides the ultra-high vacuum environment needed for the growth of material. VARIAN / VEECO GEN II also provides a wide range of other components, such as a residual gas analyzer, microwave electron cyclotron resonance plasma source, and an annular dual beam evaporator. Overall, VEECO GEN II MBE machine offers a unique combination of flexibility and control to support the efficient production of high-quality, homogeneous semiconducting thin films with superior structural and electrical properties. It is highly valued for its ability to maintain a closed loop control tool, enabling precise and consistent film growth and uniformity of the semiconductor materials developed.