Used VARIAN / VEECO GEN II #9257237 for sale

VARIAN / VEECO GEN II is a molecular beam epitaxy (MBE) equipment designed for the growth of low temperature devices such as superconductors, semiconductors, and ferromagnetics. It is composed of a UHV (ultra-high vacuum) chamber, a series of deposition sources, and a set of mass-analyzers. The UHV chamber is designed to maintain its interior environment at pressures less than 2 x 10^-7 Torr, far lower than available in conventional laboratories. This is done by maintaining a total absence of particulate matter inside the chamber while relying on a combination of pumps and continuous gas introduction to maintain the low pressure. The particle count inside the chamber is then monitored and managed by a control system. Deposition sources inside the chamber allow for controlled growth of materials such as GaAs, InP, Si, Ge, and many others. The sources consist of multiple quartz boats (for solid sources) held against heaters to hold a setpoint temperature and a resistive vapour source. The boats are adjustable in the x, y and z-plane, allowing for fine adjustment of layer thicknesses. The boat temperature is precisely controlled using a thermocouple unit, calibrated to less than 200°C. The mass-analyzer machine is used for residual gas analysis or for direct flux measurement of sources inside the chamber. It consists of various ionization sources that interfaces directly to the UHV chamber via a differentially pumped side-port. This tool can detect species such as O2, H2O, air, and many others. The UHV chamber, deposition sources and mass-analyzers are all connected to a computer operator station. This station contains a data acquisition asset and a control interface, allowing for automation of the entire deposition process. The model features seven recipe-controlled recipes and a wide range of customizable parameters, making it suitable for a large variety of substrate material and device types. VEECO GEN II is an advanced MBE equipment and remains the choice of many researchers in the low temperature device field. Its strong combination of UHV requirements, deposition sources, and gas analysis capabilities allow for a wide range of device-related experiments, making it a valuable tool for research and device manufacturing.