Used VARIAN / VEECO GEN III #9196890 for sale

VARIAN / VEECO GEN III molecular beam epitaxy (MBE) equipment is one of the most advanced systems for the deposition of thin-film materials at the nanometer scale. The system uses a combination of three different epitaxy growth sources: two low-energy electron beam evaporators and an ultra-high vacuum shatter-in-vacuum source. It is designed to provide growth rates of up to two orders of magnitude higher than traditional MBE systems. Additionally, VEECO GEN III has superior temperature control and precision for each source, enabling higher growth rates, higher conformality, and the ability to fine-tune the growth process. The unit is also equipped with a range of measurement and monitoring capabilities including in-situ reflection and reflection high energy electron diffraction (RHEED), as well as integrated analysis using a micro-Raman, scanning electron and atomic force microscopes. In addition, a suite of software tools allows engineers to monitor and manage all aspects of the growth process. VARIAN GEN III also provides a variety of substrates and inert gases, enabling users to create a wide range of materials, both in terms of composition and properties. This includes III-V compounds, as well as oxides, nitrides, and oxynitrides. Additionally, the advanced temperature control capabilities of GEN III allow for the parallel deposition of two materials in sequential growth processes with different temperatures for each material, thus providing for multi-level device fabrication. Overall, the combination of the MBE growth process and advanced measurement and monitoring capabilities of VARIAN / VEECO GEN III molecular beam epitaxy machine makes it one of the most powerful thin-film materials growth systems available. It is able to produce materials with a wide range of properties, from thin films to three-dimensional devices comprised of different materials.