Used VARIAN / VEECO GEN III #9197483 for sale

VARIAN / VEECO GEN III molecular beam epitaxy (MBE) equipment is a high-precision research tool that is used to create thin films on a substrate. This technology is most commonly used in the deposition of materials on a variety of substrates such as silicon, gallium arsenide, and zinc oxide. This system is able to deposit layers of material that are only a few nanometers thick, with greater uniformity and accuracy than other deposition processes. This makes VEECO GEN III an ideal unit for the creation of small-scale devices or components. The machine consists of several major components, the evaporator, the shutter, the gas shutter, the quartz crystal monitor, the resistor heater, the directional mass flow controller and the power supplies. The evaporator is used to hold and heat material that is to be deposited on the substrate. The shutter controls the flow of material as it passes from the evaporator. The gas shutter is used to control the inclusion of gases such as nitrogen and hydrogen in the material as it is being deposited. The quartz crystal monitor provides feedback on the thickness and uniformity of the material being deposited, while the resistor heater is used to keep the evaporator at a given temperature. The directional mass flow controller is used to adjust the pressure and velocity of the material, while the power supplies are used to supply the proper voltage and current to the tool components. VARIAN GEN III asset is also equipped with a variety of safety features, including overload protection for the evaporator, ion pumps for chemical containment, and filter pumps for particle containment. The model is highly automated, with software designed for efficient control of all the equipment components. The software also has the ability to control a variety of additional components, including temperature profiling and positioning of the substrate, to create intricate deposition patterns. GEN III system is considered the leading deposition technology due to its accuracy and precision in depositing layers of semiconductors and other materials. This unit is widely used for research and development and has been used in the creation of many products including semiconductor chips and optical components. Its ability to create small-scale and intricate components has made it an invaluable tool in advanced technology development.