Used VARIAN / VEECO GEN III #9239247 for sale

VARIAN / VEECO GEN III is an advanced molecular beam epitaxy (MBE) system used to deposit thin semiconductor films on various substrates. It consists of four chambers that are interconnected and configured to perform low-temperature homoepitaxial growth, oxides and nitrides, and other advanced epitaxial processes. The first chamber houses a multi-debugger source. It is equipped with up to six horizontal or debugsources that are individually isolated to prevent contamination of the substrate by other materials. The multi-sources can be varied in current, power, and frequency to suit the desired deposition process. This chamber is also equipped with the necessary source accessories such as an electron beam shutter, heat shields, and Shottky suppressors. The second chamber contains the substrate holder, which is a vertical rotating assembly that can accommodate up to four substrates. It also houses a load-lock and sample can be heated to temperatures between -100°C and 800°C to allow for advanced growth processes. Two shuttered manipulators and a main shutter serve to shield the substrate, while a leveler ensures uniform substrate heating. The third chamber is the growth chamber, outfitted with a heating filament, eight gas injectors, and a cryopumping line. The filament is designed to supply the necessary energy for growth temperatures between 300 and 900°C. The gas injectors are connected to a gas panel, which is used for the delivery of source and dopant gases to the growth chamber. The cryopumping line is used to maintain a low background pressure by pumping out residual gases. The fourth chamber is the result chamber, where the resulting thin-film is characterized. This chamber is outfitted with a quadrupole mass spectrometer (QSMS) for species identification and a residual gas analyzer (RGA) for composition analysis. It also includes an automated sample transfer station for examining wafers in a separate photomicroscope chamber. VEECO GEN III is an advanced MBE system designed for operations and research purposes. Its multiple chambers, state-of-the-art components, and availability of advanced growth processes make this system ideal for high throughput deposition and process development.