Used VEECO GEN 2000 #293610396 for sale
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VARIAN / VEECO GEN 2000 is a single-chamber Molecular Beam Epitaxy (MBE) equipment. It is a versatile and sophisticated tool used to deposit and process thin layers of elemental and compound semiconductor materials. MBE is a vapor-phase growth process which allows for precise control over the composition, thickness and doping of semiconductor layers. VEECO GEN 2000 MBE system utilizes atomic beams from multiple elemental sources which are combined and directed downward onto the heated substrate. The substrate can be composed of either single-crystal or polycrystalline semiconductor materials and is heated to the growth temperature. The chamber is maintained to a low base pressure in the 10^(-11) to 10^(-7) Torr range, then the desired vapors condense on the substrate surface to form a well-defined crystalline layer. VARIAN GEN 2000 provides an exceptionally stable growth environment allowing layers to be grown with excellent uniformity, homogeneity and crystalline quality. The unit utilizes an Ultrasonic Encoder to precisely monitor the deposition rate of the layers. This high-precision control over the growth conditions provides an ideal platform for developing complex structures such as semiconductor superlattices and quantum wells. GEN 2000 MBE machine includes two high-accuracy shutter shutters, a controllable shutter pulse drive, automated reflectometer and a high accuracy auto-leveler. The shutter shutters provide adjustable control of the atomic beam intensity and the shutter pulse drive allows for accurate control of the shutter pulse length. The automated reflectometer is used for rapid in situ optical monitoring of the thickness of the semiconductor layers being deposited. The high accuracy auto-leveler continuously adjusts the substrate to maintain levelness even when uneven surface loading is present. VARIAN / VEECO GEN 2000 MBE tool also offers a range of advanced process control, such as in situ feedback control of deposition rates, automated process control of pulsed deposition, automated reactant control and loadlock assisted process control. VEECO GEN 2000 MBE asset is a leading example of modern materials processing capability. It provides technologically advanced tools to enable the deposition of complex semiconductor materials with unparalleled accuracy and control.
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